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Effect Of Temperature On Properties of Zirconium Nitride Fil

2018-12-02 10:53 View:
Zirconium nitride film is a new type of coating material with high hardness, high melting point, good chemical stability, golden metallic luster, and wide application in machining, electronics, optics and decoration. According to its excellent electrical conductivity, it can be used as an electrical contact layer in the electronics industry; its beautiful golden appearance can be used as a decorative film.
The method for preparing the zirconium nitride film includes a magnetron sputtering method, an arc ion plating method, an ion beam deposition method, a pulsed laser deposition method, etc., wherein the magnetron sputtering is a low temperature deposition process. At a low temperature, a zirconium nitride film having excellent properties, uniform film layer and good adhesion can be deposited.
The hardness of the film is related to the structure of the film layer, such as the optimal orientation, the half-height width of the grain diffraction peak, and the defect density. When the molding temperature changes significantly, the temperature will become the main factor affecting the hardness, because the temperature rise will lead to the film. The internal defects are greatly reduced, and the defects inside the film are the main contributors to the hardness of the film.
The results of nanoindentation roughness on the surface of the film obtained under different deposition temperatures, the roughness of the zirconium nitride film increases with the increase of deposition temperature. The nanoindentation roughness reflects the height difference between the highest and lowest layers of the film layer, and the roughness of the zirconium nitride film layer increases as the deposition temperature increases.
Increasing the deposition temperature of zirconium nitride leads to a regular decrease in the nanoindentation hardness of the film layer; at the same time, the grain size in the film layer grows; the voids between the crystal grains are significantly reduced; a certain degree occurs between the crystal grains. mosaic. While the compactness of the zirconium nitride film layer is improved, the nanoindentation roughness of the film layer is increasing.

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